From Firearms to Fighter Jets: How DLC and HiPIMS Coatings are Quietly Winning the Defense Game
Matt Linford Team
A line of vacuum foreline traps that are ideally suited for manufacturing processes such as ALD (atomic layer deposition) that generate large volumes of solid byproducts, organic solvents, and other contaminants have been introduced by Mass-Vac, Inc. of North Billerica, Massachusetts.
Lyndhurst, NJ – NAVAC Vacuum Technology, the world’s largest rotary vane pump manufacturer with a three-decade history of vacuum technology advancements, has announced the launch of its new ShieldDrive “i Series” Rotary Vane Vacuum Pumps, an enhanced evolution of the company’s proven ShieldDrive SD Series engineered for demanding laboratory and industrial vacuum applications. The updated “i Series” introduces two new maintenance-focused enhancements: a Quick-Change Oil Mist Filter and an Easy Oil Change system. Together, these features are intended to improve uptime, simplify service, and support a cleaner operating environment.
Ultrafast control of magnetic textures relies on understanding how domain walls respond to femtosecond laser excitation. Previous X-ray scattering studies suggested transient domain-wall broadening and motion during reversible demagnetization. Yet such dynamics have never been observed directly, owing to insufficient spatiotemporal resolution in existing techniques.
The article explains why enriched isotope targets are important in medical radioisotope production research, and how SIMS can help researchers assess isotope distribution, surface composition, contamination and depth variation in scarce or high-value solid materials.
Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.
Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.
Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.
Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.
Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).
Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.
Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.
Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.
Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.
Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our 2026 editorial calendar which lists the topic for each issue.
