Vacuum Deposited Thin Functional Films of Protective Layers for Applications in Personalized Physiological Monitoring

Dr. Megha Agrawal and Dr. Shyamasri Biswas

May 2022 VT&C Digital Magazine

Nanotechnology: Production of Superior Crops without Genetic Modification

Dr. Abhijit Biswas

April 2022 VT&C Digital Magazine

Combining Integrated Photonics and Ultrafast Electron Microscopy

Dr. Abhijit Biswas

March 2022 VT&C Digital Magazine

Thin Film Solar Cells: Dye Sensitized Solar Cells

Dr. Peter Martin

February 2022 VT&C Digital Magazine

Fitting the Spectroscopic Ellipsometry Data from a Rather Thick Film on Fused Silica Part3

Matt Linford and Team

January 2022 VT&C Digital Magazine

Guides to Vacuum Technology: Vacuum Education and Training Programs Part 1

Steve Hansen

December 2021 VT&C Digital Magazine
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Industry News

Hiden Analytical: New Atmospheric Plasma Applications Catalogue

Hiden Analytical develops and supplies instruments for a new era of analysis of ions, radicals and neutrals from high pressure plasmas. The latest in the range of application showcase brochures, Atmospheric Plasma Applications, offers an insight into the applications that Hiden’s atmospheric plasma range address. The Hiden instruments for atmospheric plasma analysis include the HPR-60 MBMS as well as the HPR-20 R&D gas analysis range. The HPR-60 system is a specialised system, developed specifically for direct measurement of atmospheric plasma species. The HPR-20 R&D allows for real time gas analysis of neutral products from plasma, effective in plasma catalysis applications.

Hiden Analytical: New HPR-30 Series for Vacuum Process Analysis

Hiden Analytical introduce the HPR-30 Series quadrupole analysers for vacuum process analysis.

The Hiden HPR-30 Series are bolt on vacuum process analysers designed for fast response, high sensitivity analysis of gas and vapour species. Equipped with Hiden’s multi-level software package, offering simple control of mass spectrometer parameters and complex manipulation of data and control of external devices. Applications include leak detection, contamination monitoring, process trend analysis and analysis of high mass species and precursors used in ALD and MOCVD.

Oak Ridge National Laboratory: ORNL, TVA partner to drive decarbonization, explore carbon-free technologies

The U.S. Department of Energy’s Oak Ridge National Laboratory and the Tennessee Valley Authority, or TVA, are joining forces to advance decarbonization technologies from discovery through deployment through a new memorandum of understanding, or MOU. Eliminating carbon dioxide emissions in the production of U.S. electricity is essential to achieving the federal government’s goal of net-zero carbon emissions. TVA — which provides electricity for 153 local power companies serving 10 million people in Tennessee and parts of six surrounding states — is actively implementing a variety of new technologies in pursuit of this goal.

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VT&C Featured Buyer's Guide 2022


VT&C Buyer's Guide 2022

Vacuum Technology Primer

Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.

Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.

Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.

Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.

Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).

Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.

Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.

Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.

Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.

Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our editorial calendar which lists the topic for each issue.