The Emerging Super Black Nanomaterials Poised for Broad Technological Impact

Dr. Narendra Parmar, Dr. Ilker Bayer, Abhijit Biswas

December 2019 VT&C Digital Magazine

Plotting XPS Narrow Scans and other Data with MATLAB Part 1

Matt Linford and Team

November 2019 VT&C Digital Magazine

Active Thin Films: Ferroelectric Thin Films and Nanostructures

Dr. Peter Martin

October 2019 VT&C Digital Magazine

THz Photonics for Next Generation High Capacity Wireless Communication Technologies Beyond 5G

Dr. Abhijit Biswas

September 2019 VT&C Digital Magazine

Laser Based Bioprinting Brings Hope in 3D Tissue Constructs from the Ground Up

Dr. Megha Agrawal, Dr. Aisha Siraj, Dr. Shyamasri Biswas

August 2019 VT&C Digital Magazine

Photonics and Microelectronics: On-Chip Optical Amplifiers and Light Sources on Silicon Platform Can Take the Hybrid Photonic Integrated Circuits to the Next Level

Dr. Abhijit Biswas

July 2019 VT&C Digital Magazine
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Industry News

Ulvac Inc.: ULVAC Inc. and Silex Microsystems AB Sign Joint Development Agreement on Leading-Edge Sputtered PZT for MEMS

Kanagawa, Japan – November 25th, 2019 – ULVAC, Inc. (ULVAC), headquartered in Kanagawa, Japan and lead by CEO Setsuo Iwashita and SILEX Microsystems AB (Silex), headquartered in Järfälla, Sweden and lead by CEO Edvard Kälvesten, today announced they have signed an agreement to develop a production thin film piezoelectric process (PZT) for MEMS actuators and sensors with cutting edge performance and reliability.

Berkeley Lab: News Center Rare Disease Q&A: What Rare Diseases Are and Why That Matters

Inspired by the enormous unmet needs of people with rare diseases, a group of scientists from across the globe has teamed up to develop open-access tools and resources for sharing disease characteristics and treatment information. The research is centered around an artificial intelligence-enabled catalog of disease descriptions called Mondo, which, like a Wikipedia for rare diseases, can be added to and improved by the scientific and medical community.

Oak Ridge National Laboratory: Fusion – Argon calling

As scientists study approaches to best sustain a fusion reactor, a team led by Oak Ridge National Laboratory investigated injecting shattered argon pellets into a super-hot plasma, when needed, to protect the reactor’s interior wall from high-energy runaway electrons. Other pellet materials, frozen from room-temperature gasses, have successfully reduced the plasma’s thermal energy, but argon was most effective at runaway electron dissipation. Using fuel pellet injection technology – which literally shoots cryogenic pellets of fuel into the plasma to raise its density – the team used an injector optimized for argon during a series of tests at the DIII-D National Fusion Facility. “Now that we have demonstrated argon’s effectiveness, our next step is to determine how many pellets and pellet injectors are needed for a solution that’s applicable,” said ORNL’s Larry Baylor. This research may be scaled up for possible application on ITER, the international experimental reactor.

Archived Articles and Blogs

Vacuum Technology Primer

Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.

Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.

Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.

Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.

Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).

Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.

Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.

Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.

Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.

Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our editorial calendar which lists the topic for each issue.