The Hiden HPR-30 Series are bolt on vacuum process analysers designed for fast response, high sensitivity analysis of gas and vapour species. Equipped with Hiden’s multi-level software package, offering simple control of mass spectrometer parameters and complex manipulation of data and control of external devices. Applications include leak detection, contamination monitoring, process trend analysis and analysis of high mass species and precursors used in ALD and MOCVD.
Pfeiffer Vacuum announces that beginning November 1, 2022, Nor-Cal Products will begin doing business as Pfeiffer Vacuum Valves & Engineering. In 2017, Nor-Cal Products was acquired by Pfeiffer Vacuum which launched a new phase of the company’s growth. Located in Yreka, CA, the company manufactures vacuum components, valves and chambers to industrial equipment manufacturers, universities, and national laboratories. This product range further enhances the vacuum solutions portfolio that Pfeiffer Vacuum provides to its customers.
The Advanced Light Source (ALS), a scientific user facility at the Department of Energy’s Lawrence Berkeley National Laboratory (Berkeley Lab), has received federal approval to start construction on an upgrade that will boost the brightness of its X-ray beams at least a hundredfold. “The ALS upgrade is an amazing engineering undertaking that is going to give us an even more powerful scientific tool,” said Berkeley Lab Director Michael Witherell. “I can’t wait to see the many ways researchers use it to improve the world and tackle some of the biggest challenges facing society today.”
Tip 1: Better thermal conductivity Tip 2: Lower bakeout temperatures Tip 3: Reduced hydrogen outgassing rates (See website for full paper)
Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.
Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.
Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.
Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.
Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).
Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.
Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.
Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.
Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.
Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our editorial calendar which lists the topic for each issue.