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Electron-Beam, Ion-Beam and Magnetron Deposition and Coating Systems
Compiled by Terrence Thompson, Contributing Editor
This annual product showcase update describes many examples of the latest thin-film deposition and coating systems used in a wide variety of production, R&D and other applications.
Vacuum-based, thin-film deposition and coating systems just keep getting better and better. Costeffective and efficient deposition technologies are available for a wide range of thin-film materials to provide end users with many options. Depending upon the system and technology selected, systems can form layers with thicknesses ranging from of a few nanometers to several microns.
Thin film deposition technologies can be physical, evaporative and sputtering systems, or chemical including gas and liquid phase processes. Some processes are based on glow discharges and reactive sputtering which combine physical and chemical reactions are known as physical chemical methods.
Thin-film deposition and coating applications continue to increase at a rapid, finding new uses ranging from razor blade coatings to quantum-well lasers to superconductors. Advances in thin-film technology for semiconductors, MEMS and photonic devices enable ongoing advanced device fabrication, advanced discrete and wafer-level packaging of microcircuits and optical devices. Applications such as hard-amorphous carbon deposition and metal-interconnect deposition schemes are widely used in semiconductor manufacturing. Other applications benefiting from extremely hard coatings are cutting and forming tools where coatings reduce friction and wear with coating materials such as TiN, CrN, TiCN and AlTiN.
Product Descriptions
In the following product descriptions, and on the manufacturer’s websites, vendors make valid distinctions to focus on specific niche market segments so direct comparisons may be difficult. When in doubt, go to Vacuum Technology & Coating magazine’s home page at and click on the advertiser links for additional details or telephone numbers for calling to discuss your specific application requirements. With their experience, they can help you make the right choices.
ATC 2200 Ion Beam Assisted Deposition (IBAD) System at Half the Cost of Dual Ion Beam System with the Same Results
AJA International, Inc.’s has developed an IBAD coating tool that operates at 1.0 -3.0 × 10-4 Torr. Traditionally, magnetron sputter  sources were unable to sustain their plasma discharge at this low pressure where ion sources were most efficient (optimum flux and energy). AJA International, Inc. has now developed a new version of the A300-XP Series Magnetron Sputter Source which is capable of operating into the high 10-5 Torr range and still includes all the features which deliver ± 2% uniformity over substrates up to 8" diameter. Combining 3 or 4 of these low-pressure magnetrons with an ICP RF Plasma/Ion Source delivers highly uniform, ion-assisted depositions at rates identical to dual ion beam systems. Operation and geometries are significantly simplified and the cost is typically much lower while achieving identical results. www.ajaint.com
ATC Dual Chamber UHV Sputtering Systems for Large Area Substrates, Incompatible Processes, PV R&D
AJA International, Inc. has recently installed a new type of dual chamber sputtering tool with a common, centrally located cassette for 8" wafers. Each chamber features an 800°C , rotating, RF bias able substrate holder with working distance adjustment. The chambers accommodate (4) and (6) 3" UHV magnetrons respectively, each with in-situ tilt and modular magnet arrays. This configuration is ideal for incompatible processes on large area substrates. This dual system is easily converted to photovoltaic R&D with 156 mm2 substrates. www.ajaint.com
ATC ORION Series Deposition Systems — Compact, Cost Effective, Research Tools with Modular Design
AJA International, Inc.’s introduced its ATC ORION Series deposition system, a compact, feature rich, premium quality alternative for researchers with limited budgets. Derived from the heritage of the larger, highly popular ATC Series Magnetron Sputter Systems, the ATC ORION offers a design  approach that is unrivaled in today's market: All modules are field retrofitable including computer control. These compact tools are available with 1-10 Torr magnetron sputter sources and can be either HV or full UHV design. The integrated 2-inch magnetrons are special versions of the field proven A300-XP and Stiletto Series modular magnetron sputter sources (over 4000 of these sources operate worldwide). Substrate cooling/heating from LN2 to 1000°C, substrate rotation, substrate RF/DC bias, substrate Z motion, turbo load-lock, RF/DC generators, pulsed DC, automatic closed-loop downstream pressure control and computer control are just a few of the available option modules. Finally, in the tradition of AJA’s highly uniform, con-focal deposition designs, the ATC ORION delivers a minimum guaranteed ± 2.5% thickness uniformity over 4 inches for any material due to a special source design feature (patent applied). www.ajaint.com
ATC 1500-E HYBRID UHV Deposition Systems — Sputtering for E-Beam/K-Cell/Thermal/ Ion Beam/Anneal/B Field
AJA International, Inc. has delivered numerous, multi-chamber ATC HYBRID deposition systems with a variety of deposition/modification/analysis techniques such as on axis, con-focal and off-axis magnetron sputtering, evaporation, oxygen anneal,  transverse magnetic field application, ion beam assist, milling and oxygenation, RHEED and finally post deposition surface analysis. These UHV chambers are connected via UHV gate valves and magnetic linear transfer tools allowing multiple, incompatible processing steps to be performed on a single substrate without exposure to atmosphere. AJA International, Inc.’s ATC and ATC ORION SERIES deposition systems are always designed to allow attachment of appendage chambers thereby creating the possibility of future ATC HYBRID systems as single purpose tools are expanded. www.ajaint.com
ATC ORION-M Ion Milling System for 150 mm Diameter Substrates Priced Under $200K
AJA International, Inc.’s ATC Orion-M is sized for single 150 mm substrates and features a ± 90° tiltable, rotating, water- cooled substrate  holder. Ion sources are flange mounted to the chamber's fliptop for ease of service. The system can be fitted with a multi-functional ICP plasma source, a highenergy capacitively-coupled plasma source or a tradition gridded ion source. Vacuum pumping can be cryogenic or turbomolecular with HC or Dry mechanical pumps. Options include SIMS endpoint detection, loadlock, biasable water cooled substrate holders, computer control and a variety of substrate heaters.
AJA International, Inc.
Scituate, MA
www.ajaint.com
Contact: William Hale, President Tel: 1-781-545-7365
E-mail: topgun@ajaint.com
Integrity Series Evaporation System
The Denton Vacuum LLC Integrity series provides Evaporation technology using multiple resistance and electron beam gun configurations. Chamber geometry is optimised for the specific application. IAD processes, optical monitoring and sophisticated  automation and controls are typical features of these machines. Various fixturing arrangements offer increased uniformity and flip-over tooling is available for coating both sides of a substrate. The Integrity has been supplied in chamber sizes from 20 to 80 inches for applications as diverse as ophthalmic coating, laser bar facet coating, precision optics and optical filters. The Explorer series offers small-scale manufacture and R&D application with various configurations in a small footprint. A single electron-beam gun can be configured with IAD and sputtering cathodes for development applications. Denton Vacuum is celebrating over 40 years as a leading supplier of thin-film coating equipment with an established range of systems offering flexibility and performance to meet the most demanding applications. Denton offers a unique combination of hardware configuration, automation and controls, and process assistance to create powerful depositions systems for industry and research. www.dentonvacuum.com
Discovery and Explorer Series Sputtering Systems
The Denton Vacuum LLC Discovery series provides Sputter technology with a standard hardware configuration with a choice of 1, 2, 3, or 4   cathodes. The Discovery series has proven to be extremely successful with over 80 units installed worldwide. Cathodes from 2 to 4 inches are standard. Systems can easily be upgraded in the field to add additional cathodes. DC and RF power are offered, along with a selection of loadlocks for single or multiple substrate transfer. Denton offers both confocal and perpendicular cathode arrangements. This allows the user to select between enhanced uniformity on single
samples or for lift-off applications. The Discovery has been supplied in chamber sizes from 18 to 35 inches. The Discovery 550 is available with increased cleanroom compatibility. The Explorer series offers small-scale manufacture and R&D application with various configurations in a small footprint. A choice of up to three cathodes can be configured.
Denton Vacuum LLC
Moorestown, NJ
www.dentonvacuum.com
Tel: 1-856-439-9100
E-mail: info@dentonvacuum.com
Electron Beam Gun and Ion Source Evaporation Products
Fil-Tech, Inc. supplies complete  electron beam emitter assemblies for Temescal and Telemark guns. Fil-Tech also supplies individual emitter parts including filaments, insulators, beam formers, and anodes. Electromagnetic coil assemblies, OFHC crucibles, and crucible liners are also available from stock. Fil-Tech sells replacement parts for Veeco Commonwealth and Veeco Ion Tech, and Satisloh Ion Sources. Fil-Tech supplies ion source filaments, insulators, gas distributors, anodes, and cathode tips. Fil-Tech’s parts will meet or exceed the original manufacturer's specification, are competitively prices, and available for immediate delivery.
Fil-Tech, Inc.
Boston, MA
www.filtech.com
Contact: G. Paul Becker
Tel: 1-617-227-1133
E-mail: paul@filtech.com
Cluster Module Biased Target or Conventional Ion Beam Deposition Systems
4Wave’s deposition systems address the  needs of users in depositing dielectric, metallic, magnetic, superconducting and semiconducting thin films in production environments. Users can deposit multi-layers on samples up to 200 mm using either Biased Target or conventional Ion Beam deposition technologies. Several options are available including low energy ion assist, high-energy ion etching, heated stage, and magnetic stages. Typical applications include spin valves/AMR/GMR/TMR,
magnetic-tunnel junctions, dielectric interference coatings, Rugate filters, high-k materials, shape memory alloys, optoelectronic materials, superconducting materials, uncooled IR sensors, and VOx. Available system features include low energy gridless plasma sources, ion assisted deposition (gridless or gridded source), hollow cathode electron source, 6 × 8, 3 × 12" or 2 × 16 inch biased target carousels, pulse DC targets from 1 Hz to 250 kHz up to 1300 V, Up to 200 mm diameter process surface, < 3% non-uniformity, closed loop control of film properties, substrate plasma cleaning, etching oxidation, nitridation, water cooling, tilting, rotating, magnetic shuttered stage, robotically loaded, optically aligned wafers, and load lock with up to 25 wafers.
4-Wave
Sterling, VA
Contact: Trey Middleton
Tel: 1-703-787-9283 Ext. 100
E-mail: sales@4waveinc.com
Integrated Reactive Sputtering Solutions
For customers who do not require a complete turnkey facility, but would like a package of critical pre-configured components for their  process needs, Gencoa has options. By combining the Speedflo reactive gas controller with Gencoa dual magnetrons, a customer has the components needed for success—just add the chamber, pumping and power. The integrated packages include sputtering hardware, process monitoring, process control software, reactive gas distribution and training. The package is pre-configured for the specific process needs to create the uniformity, process speed and performance you require. Typical applications include web coating of dielectric stacks, precision optics/opthalmics, hard/low friction coatings, architectural glass and flat panel displays. Any material combination can be used with single or multi-channel gas control. Process monitoring can be via plasma emission or target voltage and the gas system is designed for fast feedback and uniformity adjustment. The magnetic design in the sputter cathodes is tuned to create the optimum plasma conditions for the process environment as a critical feature of the package.
Gencoa Ltd.
Liverpool, United Kingdom
www.gencoa.com
Tel +44-0151-486-4466
E-mail: sales@gencoa.com
744i Large Area, Four-Target,
Batch-Sputtering System
Built on the production workhorse 600 platform, the KDF 744i features full 200 mm wafer capability, this allows the tool to perform the workload of four 603i systems saving a significant cost over multiple systems. The large area vertically oriented 744i system is the perfect solution for  those particle sensitive processes such as TiW and TaN which have tendencies to generate device damaging particles. Using a pallet size of 19 × 19 inches, a host of substrate sizes can be accommodated with this system. As in all inline KDF systems the user can easily change substrate sizes at will run to run. Despite its tall chamber and 24.5-inch cathodes the 744i has a shortened mainframe assembly that helps make the system operator friendly and ergonomically correct. A heated and hi vacuum load lock is standard on the 744i system, this setup allows the user to pre-heat process pallets in the load lock while sputtering or etch processing another pallet simultaneously in the main system. All KDF systems have full capability to be connected to a customer’s intranet or to the Internet for complete remote access and control. To help insure statistical process control the system has full data log monitoring and reporting capabilities. The 744i system also utilizes KDF’s family of in-housed designed cathodes, which covers the full spectrum of materials to be sputtered. KDF’s Inset Cathode™ can achieve up to 60 % utilization while delivering better then 4 % pallet uniformity. From dielectrics, magnetic materials, or precious metals KDF has a cathode to fit. The KDF 744i is equipped with all the latest in OEM technology like MKS cluster gauges and Advanced Energy Pulsed power supplies. The software features of the tool are extensive, including but not limited too auto cryo regeneration, auto pump and vent, programmable target burn-in, particle test mode, selectable slew modes, multi servo power mode selections, scan profile mode, multipass up to 9999, and repeat recipe mode. With systems installed around the world the 744i is a production proven and reliable tool. www.kdf.com
844i Large Area Sputtering System
The all new second generation KDF 844i system is a large area vertical system that has increased its handling size to handle the ever increasing demands of the high density interconnect, 300 mm, OLED and flat panel display markets. Despite its increased handling size the system still requires a compact footprint that is less than one third of its competitors. The 844i now utilizes a  pallet size of 26.5" × 30" giving it enough capacity to load glass panel substrates up to Gen 3.5. The new 844i system is also now coupled with KDF’s PAT (pallet assist tool). The KDF designed pallet manipulator allows operators to safely handle pallet payloads of up to 100 lb., and its horizontal and vertical movements allow for easy substrate loading as well. The standard tool is integrated and interlocked for both operator and system safety. The new 844i has also been redesigned specifically for thru the wall clean room compatibility as well as having a completely shielded internal chamber area allowing for faster chamber cleaning and less clean room contamination. A user-friendly mobile operator interface cart allows for complete control and system accessibility from any point around the tool. The tool features four 30-inch cathodes that can be chosen from the complete KDF family of in house designed cathodes including the KDF Inset™ and patented full-face erosion LMM™ cathodes. The tool features two processing pallets allowing for instantaneous changes of wafer sizes and the ability to process both the front and backside of the wafer. www.kdf.com
943i Compound Semi Sputtering Tool
By far KDF’s most popular and best selling system, the 943i has been improved upon again. This production tool is by far one of the most cost effective tools in the market place today with over 300 hundred of these systems out there KDF has gained recognition of being a superior tool supplier. With a 12 × 12 inch pallet area this tool allows simple orientation to  substrates with next to no fixturing or holders, this makes this tool extremely simple for odd or irregular shaped substrates. The 943i is a perfect fit for R&D or full production needs, with extensive recipe manager and overall tool configuration possibilities this system can perform any task. The tool is standard equipped for both up and down stream process gas controls, it is plug and play for additional gas's in the field, or just changing gas ranges. KDF software platform is like no other with an OEM configuration page that builds the system as per the customers needs. The standard software package allows the customer such attributes of choosing KW voltage or current control for DC operation, or by letting the user choose kW, kV or Load Power control for RF operation. KDF maintenance screens allow total automation in Target burn in, while keeping complete track of all KW hours. To take full advantage of suppliers hardware KDF incorporates R3232, RS485 and Ethernet IP to allow full interfaces to products and being able to view and change parameters interactively. KDF's large Cathode selection allows this tool to be extremely versatile, KDF also offers our exclusive ix Series of cathodes with measures 5 × 17 inches, allowing for more improved uniformities without shields or apertures. KDF’s Inset Cathodes™ , Planer Mag, Planer Diodes, Magterial™ , and LMM™ [full face erosion] cathodes are all offered in this size as well. The ERRP™ or planetary pallet offers uniformities better then 1% and 0.5% run to run. www.kdf.com
954i In-Line, Sputter Down, Batch Expanded Platform
Based upon its extremely popular predecessor, the new KDF 954i tool incorporates all of the 943i capabilities and adds a fourth target location. Constructed with a deeper chamber for increased substrate height, (up to 3") and increased spacing of etch to target position, (enhanced etch uniformity) the 954i has been successfully sold into markets that require critical applications at a low  cost of ownership. Critical depositions are accomplished by the use of the ERRP planetary pallet option, this option enables customers to achieve uniformities below 1%. The 954i comes equipped with a CTI 10F on the main chamber and a CTI 8F on the load lock, this standard pump configuration allows for fast pump downs and quick recoveries for improved throughput. With the addition of an integrated RGA the customer may perform in process gas sampling during a sputter process, or perform a Hi-vac step with a RGA profile. The extended ix cathode families are the most popular with this tool, providing the additional expanded pallet to cathode aspect ratio for improved overall uniformities. The 954i is a versatile tool that is utilized to deposit films on a host of different size substrates from wafers to unique three-dimensional parts. All KDF systems are built on a Common Software platform, which enables us to provide the largest spectrum of hardware options and overall configurations for our customers who have special product requirements. KDF’s process expertise coupled with our hardware and software provide the best possible results for high rate reactive sputtering modes, a specialty of KDF. www.kdf.com
974i Sputtering System with Increased 20 × 20 Inch Pallet Size
The all-new KDF 974i tool, is another KDF innovation which now provides a larger 20" by 20" sputter area. The 974i is an excellent choice for pilot production solar applications, or scaling up production rates from smaller KDF/MRC systems. The 974i is a horizontal configured tool that allows complete end user flexibility to handle unique substrate sizes, and shapes.  This type of sputter down application increases and simplifies the uses for the tool since special substrate fixturing is generally not required. Uniformity and utilization are not compromised as KDF maintains the proper pallet to cathode ratio as in all our systems. The base tool is configured with a high vacuum cryo pumped load lock along with heat, allowing for pre heating and faster cycle times. This load lock arrangement coupled along with the four 24" cathodes allows for an array of diversified processes and higher throughput offered in a single tool. The 974i is also available with a host of options to make it even more production specific, available options include but not limited to an integrated process RGA, back side gas cooling in RF etch mode, ERPP™ KDF’s planetary pallet operation, upstream and down stream gas control, as well as pulsed DC bias. All KDF systems utilize the latest in communications control and protocol this along with. KDF’s software Recipe Manager allows for the user to have complete access and control of all the hardware features associated with the tool. The 974i is compatible with and utilizes KDF’s full compliment of 744 specialty cathodes, including the Inset Cathode™ , Magterial Cathode™ , Mark II Cathode™ along with standard planar cathodes.
KDF Electronic & Vacuum Services, Inc.
Rockleigh, NJ
www.kdf.com
Tel: 1-201-784-5005
E-mail: sales@kdf.com
KJLC NANO 36
Kurt J. Lesker Co. Nano 36 thin film deposition system is our most economical system available. Features and capabilities are similar to the old Edwards Auto306. Configured for thermal evaporation or magnetron sputtering, this system is built to be affordable, reliable, and versatile. Quick deliveries are achieved by utilizing standard KJLC products to include; off the shelf glass bell jar or stainless steel box chamber, film thickness monitor or control package, and your choice of a diffusion pump or turbo. This system’s fast pumpdown, small footprint, and user-friendly touch screen interface make it a perfect fit for any lab. For details, e-mail questions to: PED@lesker.com
PVD 75 R&D Vacuum System
The Kurt J. Lesker Company PVD 75 is a versatile, value engineered, R&D vacuum system that can be configured to suit a variety of  thin-film deposition applications. Standard features include: a frontloading box chamber, turbomolecular pump package, integrated touch screen control, and a fully enclosed “zero” cleanroom footprint when flush wall mounted. Source flange options include magnetron sputtering, electron beam evaporation, thermal evaporation and low temperature evaporation furnaces. To ensure new product reliability, the PVD 75 is built using proven process modules from other standard Kurt Lesker Company thin-film deposition systems. www.lesker.com
KJLC LAB18 Deposition System
Kurt J. Lesker Co. Lab18 thin film deposition system (shown with optional enclosed framework) is completely computer controlled and designed with the serious  researcher in mind, yet the price point is extremely competitive so it can fit into most capital equipment budgets. Standard features include: a 18" × 20" stainless steel chamber with full access door; a 685 l/s turbo pump or a 1,500 l/s cryo pump (offering fast, reliable pumpdowns); process chamber configurations with up to six magnetron sputtering cathodes; multi-pocket e-beam evaporation, thermal evaporation, or any combination thereof. The standard load lock chamber will accommodate up to 6" substrates (larger substrates with custom configurations), substrate cooling (liquid and/or LN2), or substrate heating to 1000°C. All substrate options are compatible with continuous rotation, RF and DC bias. Other standard options include ion source for sample cleaning and/or ion assisted deposition. The Lab18 is available with a fully enclosed frame (as pictured). www.lesker.com
KJLC Drum Coater Series
Kurt J. Lesker Company manufactures a series of cost effective Drum Coater PVD systems where the demand is for high process throughput. Nearly limitless substrate fixtures  of varying shapes, sizes, and applications can be accommodated in this platform. The KJLC PVD225 and PVD500 linear magnetron sputtering systems are scalable for all of your process needs. Process options include: substrate heating/cooling; and ion source installation. Closed loop control of process parameters and fully automatic operation is achieved through each system's computer control. To ensure new product reliability, the PVD Drum Coater is built using High performance Lesker sputtering cathodes which yield the highest target utilizations achievable, long target lifetimes and greater up-times. www.lesker.com
CMS Series Deposition Systems
Kurt J. Lesker Company’s CMS-18 & CMS-24 deposition systems are modular, easily configured high vacuum and UHV research tools.  CMS-18, CMS-24 Tools are primarily magnetron sputtering systems and are both available with load locks, specialized substrate stages, sequential or codeposition capability, and come standard with a Windows-based comprehensive computer control system. Our modular manufacturing makes the CMS family highly reliable, exceptional versatile and cost effective. www.lesker.com
LUMINOS Cluster Tool
Kurt J. Lesker Company’s LUMINOS Cluster Tool is a multi-chamber thin-film deposition and analysis system for R&D or pilot production applications.  Its central distribution chamber is surrounded by up to six radial process modules. The standard process modules are: substrate load lock; mask library; magnetron sputtering; thermal evaporation; electron beam evaporation; plasma cleaning; thermal annealing; oxidation; and analysis. The LUMINOS Tool is designed for any thin-film deposition, device fabrication, or analysis technique requiring in-vacuum transfer between chambers. Vacuum environments are high vacuum to true UHV. The LUMINOS tool has motor assisted manual substrate transfer. A Windows-based comprehensive computer control package is provided for pumpdown and deposition process automation. www.lesker.com
SPECTROS™ Deposition System for R&D
Kurt J. Lesker Co.’s SPECTROS is a versatile thin-film deposition system for R&D investigations into small organic molecule devices. Applications  include OLED, PLED and organic TFT structures. The single chamber system has both organic and metal evaporation sources, in situ mask changing, and a glove box interface. The typical SPECTROS system has four Lesker LTE (low temperature) organic evaporation sources and two (high temperature) metal evaporation sources. At its limit, SPECTROS can have eight organic sources and three metal sources simultaneously installed. Quartz crystal deposition monitors precisely control of film thickness and host/dopant ratios. A Windows-based, comprehensive computer-control package is included. www.lesker.com
OCTOS Cluster Tool
Kurt J. Lesker Company’s OCTOS® Cluster Tool is a fully automated cluster tool for pilot production scale processing of  substrates requiring in-vacuum substrate transfer between chambers. Available process modules include magnetron sputtering, ebeam evaporation, thermal evaporation, low temperature organic material evaporation, atomic layer deposition, chemical vapor deposition, plasma cleaning, annealing, and mask changing. The OCTOS is available with single or dual entry/exit locks and a glovebox interface. OCTOS Windows based control software provides extensive process recipe capabilities and has the ability to run each module in any sequence or independently of other modules. www.lesker.com
AXXIS Thin-Film Deposition System for R&D
Kurt J. Lesker Company’s AXXIS is a versatile thin-film deposition system for R&D and limited production applications. Although the AXXIS is a  multi-technique system, it has a relatively small footprint. Its 304 SS chamber has a hinged front-loading door, high vacuum pumping, enclosed frame, and safety interlocked operation. Standard deposition process modules are: magnetron sputtering, e-beam evaporation, and thermal evaporation. AXXIS produces single-layer and multi-layer films, and allows co-deposition. A variety of options are available including a substrate load lock. A Windows-based computer control system is standard. www.lesker.com
Custom Deposition Systems
Kurt J. Lesker Co. delivered its first deposition vacuum system, well over 20 years ago. We designed it “from scratch” and delivered it meeting the customer’s specification. Over the years we have build many hundreds of complete systems and few thousand chambers. Today, at design and manufacturing locations in the U.S. and the U.K., we design, build, test, and deliver an exception range of standard and totally custom deposition systems. By leveraging this vast technical and engineering background, we have archived a staggering array of solutions to meet the most unique application requirements. Coupling this vast applications library, our vacuum engineering expertise, our modular manufacturing approach, and our huge machine shops equipped with the latest machining centers, we approach the most novel custom deposition application with: cost effective and proven design skills; thoroughly established assembly methods; an extensive base of systems testing; and confidence.
Kurt J. Lesker Co.
Clairton, PA
www.lesker.com
Contact: David Collins, Product Manager
Tel: 1-412-387-9004 or 1-800-245-1656
E-mail: pvd_vtc@lesker.com or sales@lesker.com
Leybold Optics HELIOS Innovative Sputtering System
The Leybold Optics HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. Its specialty are high  quality optical coatings featuring very low absorption and scattering. Excellent optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Ultimate precision in layer growth control is facilitated by an optical monitoring system (option) for in-situ on-substrate meas- urements. HELIOS can be used for a wide range of optical coating applications, including edge, bandpass, color, and UV/IR cut filters as well as beam splitters and laser mirrors. Besides optical coatings, other dielectric coatings (oxides, nitrides) as well as metallic coatings can be easily produced, depending on the source configuration of the HELIOS. Applications include: precision optics; Optoelectronics; Sensors; and Telecom. www.leyboldoptics.com
Leybold Optics SYRUSpro CFM High Performance Coatings for Digital Optics
Optical thin film coatings are a key enabling technology for digital optics. Constantly increasing demands on image resolution, contrast, color definition, and brightness place exacting requirements on the optical filter performance. The Leybold Optics SYRUSpro CFM  is an innovative and cost-effective thin film coating solution for high performance optical filters, tailored to fulfill current and future requirements in digital optics. The APSpro ensures shift-free UV/IR cut filters (top), and excellent filter performance with high transmission and low ripple (bottom). Outstanding uniformity and reproducibility is demonstrated by the data of five substrate positions distributed over the calotte radius, and 6 consecutive production runs. Note: Measurement without backside AR coating. Today’s filters meet a growing range of performance parameters and must be produced within ever-shorter deadlines. This is why excellent quality is the basis for modern digital optics production. A cost-effective thin film deposition system must also deliver increased productivity through consistently high throughput and high yields. Higher product requirements combined with lower cost of ownership demands all add up to an increasingly challenging busi- ness environment for the filter manu facturer. Innovative production technology from Leybold Optics provides mass production solutions with outstanding performance, productivity and reliability.
Leybold Optics GmbH
Cary, NC
www.leyboldoptics.com
Contact: Antonio Requena
Tel: 1-919-657-7100
E-mail: antonio.requena@leyboldoptics.com
MDC e-Vap® and Re-Vap™ Evaporators
MDC produces state-of-the-art  thin film vacuum coating equipment, and offers a wide range of choices and options in both, standard off-the-shelf components and customize designs. MDC’s e-Vap® and Re-Vap™ product lines fully support electron beam or thermal evaporation methods. Featured products include the super economical and compact, 4 pocket, 3 kW, e-Vap® Mighty Source™ . Specifically tailored for pilot production, lab/R&D and the university marketplace, the Mighty Source™ provides the ideal deposition solution for your evaporation needs. Contact MDC now and request your free, Thin Film Product line brochure. www.mdcvacuum.com
MDC e-Vap® and Re-Vap™ E-Beam Thin Film Vacuum Coating Equipment
MDC produces state-of-the-art thin film vacuum coating equipment, and offers a wide range of choices and options in both, standard off-the-shelf components and customize designs.  MDC’s e-Vap® and Re-Vap™ product lines fully support electron beam or thermal evaporation methods. Featured products include the super economical and compact, 4 pocket, 3 kW, e-Vap® Mighty Source™ . Specifically tailored for pilot production, lab/R&D and the university marketplace, the Mighty Source™ provides the ideal deposition solution for your evaporation needs. Contact MDC now and request your free, Thin Film Product line brochure.
MDC Vacuum
Hayward CA
www.mdcvacuum.com
Contact: Jinny Royer Tel: 1-510-265-3500 or 1-800-443-8817
E-mail: JRoyer@mdcvacuum.com
Customized Vacuum Chambers for Sputtering Systems, Metal Evaporation and Molecular Distillation
Myers Vacuum has been servicing systems worldwide since 1986, specializing in support of customized vacuum chambers for sputtering systems, metal evaporation, and molecular distillation. Also, Myers Vacuum specializes in equipment manufactured by the former CVC Products, Inc., providing service, technical support, parts, refurbishment, upgrades and modifications. Myers Vacuum is also a leader in the manufacture and repair of shortpath molecular distillation systems and their components; a leading manufacturer of Oil Diffusion Ejector Pumps, vacuum measurement equipment, sensor tubes and automatic valve controllers. Myers Vacuum is also a top vendor of previously owned equipment.
Myers Vacuum, Inc.
Kittanning, PA
www.myers-vacuum.com
Tel: 1-888-780-8331 or 1-724-545-8331
E-mail: myersvacuum@myers-vacuum.com
Delivery Module Enables TEOS-based SiO2 PECVD
Using the Oxford Instrument Plasmalab® System100 and Plasmalab® System133 process tools, TEOS (tetraethoxysilane, tetraethyl orthosilicate) offers an alternative PECVD precursor to the commonly-used silane (SiH4.) The complete TEOS PECVD system enables high quality, conformal deposition of SiO2 for photonics, dielectric layers and other structures together with control of film stress, deposition directionality and degree of step coverage by controlling oxygen radicals. The TEOS delivery module offers an integrated purpose-designed solution with optimized heated delivery lines to ensure efficient, high-uniformity SiO2 PECVD processes and an easy source access and changeover. There is an optional glove box which can be fitted onto the module for maximum safety and the module can be connected into a clean-room extraction system if required. www.oxinst.co.uk
Atomic Layer Deposition Using FlexALTM™ Systems
Oxford Instruments’s FlexALTM™ product family offers a unique new range of flexibility and capability in the engineering of nanoscale semiconductor structures and devices by combining remote plasma ALD processes with thermal ALD in a single system. Load-locked wafer entry and full 200 mm single-wafer capability adds to the FlexAL™ tool’s ability to support the widest range of applications via the widest available range of precursors and materials. This product can be integrated into a cluster platform where required.
Oxford Instruments
Witney, Oxfordshire, UK
www.oxinst.co.uk
Contact: Lynn Shepherd, Corporate Communications Manager Tel: +44 (0)1993 880005
E-mail: lynn.shepherd@oxinst.com
Baffled Box Sources for SiO, ZnS
The R. D. Mathis Company “Baffled Box” silicon monoxide source (SiO) source, has proven to be successful for depositing silicon monoxide. The source material is positioned in the boat within separate cavities, when heated it follows an indirect path through a series of baffles and then out of the exhaust chimney. The substrate cannot see the bulk material at any time. This essentially eliminates any chance of spitting and streaming that causes pinhole type defects. Many sources are available with up, down or horizontal exhaust ports. Custom fabrication and larger volume sources to fit your specific process needs are available upon request.
The R. D. Mathis Company
Long Beach, CA
www.rdmathis.com
Tel: 1-562-426-7049
E-mail: info@rdmathis.com
SC 324 Systems — A Wide Range of Options Covering the Deposition Spectrum
The Semicore SC 324 Systems are available with a wide range of options covering the spectrum from full computer control to manual operation, from production  runs to small R&D quantities. They are economical, feature fast loading and unloading, offer broad process flexibility, and accommodate a variety of substrate sizes, shapes, and materials. Their efficiency of design, ease of operation, and unmatched reliability make them an excellent choice for a wide range of production applications. We have enhanced the original design to improve the pumping performance. The new high vacuum isolation valve boasts a 10 year warranty. Our standard automation package combines data gathering and pump performance tracking software insuring a repeatable process every time. www.semicore.com
SC 943 Reproduction of a Popular
Horizontal Sputtering System
The Semicore SC 943 is a reproduction of a popular horizontal sputtering system. Our many years of remanufacturing these platforms have led us to make numerous improvements in the OEM design, including a better pallet in place sensor, stepper motor/encoder carrier motion system, optional load lock turbo pumping capability, improved pallet exchange function, and an improved hydraulic package.  A less cluttered frame interior greatly improves maintenance access for enhanced support and up time, the new high vacuum isolation valve has a 10-year warranty. Our standard automation package combines data gathering and pump performance tracking software insuring a repeatable process every time. The SC 943 is a reproduction of a popular horizontal sputtering system. Our many years of remanufacturing these platforms have led us to make numerous improvements in the OEM design, including a better pallet in place sensor, stepper motor/encoder carrier motion system, optional load lock turbo pumping capability, improved pallet exchange function, and an improved hydraulic package. A less cluttered frame interior greatly improves maintenance access for enhanced support and up time, The new high vacuum isolation valve boasts a 10-year warranty. Our standard automation package combines data gathering and pump performance tracking software insuring a repeatable process every time. www.semicore.com
SC 1500 Series System
In-Line Sputtering Deposition Systems
Semicore’s family of In-Line deposition systems includes the SC 1500 series Sputtering System. The system provides an economical modular design to  meet a variety of process and throughput needs. Configured with single pallet load locks or multiple pallet stackers, the SC 1500 accommodates loads up to twenty 300 mm wafers, or any other substrates you can fit on the 15 × 15 inch pallet. The load lock options include RF pre-cleaning or substrate heating up to 500°C in various vacuum regimes. The main process chamber can be populated with three magnetron assemblies or other arrangements of various target shapes and sizes. RF magnetrons, DC standard or pulsed magnetrons, as well as some very new deposition techniques are available. Continuous tip to tail pallet processing or multiple scan layered coatings are all possible and recipe selectable. All this capability comes with a versatile software package for tracking every possible recipe parameter to ensure a repeatable coating every time. www.semicore.com
SC 4000 Large Chamber Volume Deposition Systems
The Semicore SC 4000 is one of our largest chamber volume deposition systems. This unit interior is almost 2 × 2 × 2 meters for large area coatings or high  throughput applications, such as Solar PV, Optical, Military, Automotive, etc. The system supports various substrate tooling configurations, including web coating (Roll to Roll), Planetary, or your custom engineered aperture. It comes with a choice of several pumping packages and deposition configurations. The SC 4000 also comes with a wide range of controls and software that easily interface with other large material handling applications. www.semicore.com
SC TriAxis True Research and Development PVD System
Semicore’s TriAxis series is an open platform design that can be configured to suit a variety of thin film deposition applications, typically for R&D or small batch production.  It is the first system to offer all three axes’deposition arrangements in a single platform. Many users have changing needs, so why not the deposition angle geometry? Many times we have discussed with users the need for versatility. One day they are in need of a sputtering system for a heated substrate, tomorrow the need changes to an Ion Beam pre-clean with a cooled wafer chuck. Load locks are available. The system also includes the electrical and mechanical expansion capabilities for the upgrade with minor field changes. The TriAxis series offers all variations of the PVD universe in a single tool.
Semicore Equipment, Inc.
Livermore, CA
www.semicore.com
Tel: 1-925-373-8201
E-mail: sales@semicore.com
High-Performance Cathodes for Deposition
Sierra Applied Sciences, Inc., is an industry leader in highperformance cathode  technology. With our superior designs, customization and diverse cathode product lines, we can support and address any complex deposition application for all customers ranging from decorative to magnetic media. We also offer ad- vanced customized designs for ITO applications that allow for lowest possible voltage operation and the highest conductivity films possible in the market today. These types of innovated designs, along with our patented magnetics allows our customers to achieve the highest target utilization possible with far superior quality films compared to our competition. We also offer the largest variety of cathode sizes, configurations, and mounting options for today's complex applications. Sierra supports products with the highest level of quality and service our customers require. Once units are delivered, we’re there for all and any after market customer support for the life of our products. Close to 80% of our annual business is from repeat customers who only choose to buy from Sierra. Sierra’s pre-purchase performance and best price guarantee makes buying easy and risk free.
Sierra Applied Sciences, Inc.
Boulder, CO
www.sierraapplied.com
Tel: 1-303-440-0861
E-mail: info@sierraapplied.com
Orion Series Evaporation System
System Control Technologies designs and manufactures physical vapor deposition (PVD) thin film coating systems and components. Core technologies include thermal, and electron  beam evaporation, RF/DC sputtering, ion plating, ion-beam sputtering, plasma deposition and ion-assisted (otherwise known as “IAD” or “IBAD”) deposition. We serve a wide variety of markets including precision optics, fiber optics, displays, electronic devices, flat panel semiconductors, functional and decorative coatings, flexible circuits, electro-optics, storage media, MEMS and nanofabrication, photovoltaics, compound semiconductors and defense industry applications. The Orion Series Evaporation System can handle optical, semiconductor or low temperature organic applications. Chamber sizes range from 500 mm to 1500 mm with multiple electron beam and thermal sources. Ion-assisted deposition and substrate pre-cleaning, plasma deposition and substrate pre-cleaning and a completely automatic system are featured. www.systemcontroltechnologies.com
High Density RF Plasma Deposition System
The System Control Technologies system incorporates patented plasma launch technology to generate a high density, highly energetic gas plasma. The technology allows high deposition rate, high yield sputtering of a range of elements, compounds and alloys, including the notoriously difficult ferromagnetic and dielectric materials. The system is also capable of very low rate deposition, while still maintaining excellent control of the product’s properties and characteristics. It is capable of generating stable plasma densities from 1010 to in excess of 1013 cm-3 , ideally suited for plasma-assisted deposition. SCT utilizes patented highdensity plasma deposition systems for applications including photovoltaics; optical telecoms; semiconductors; media storage and retrieval; precision optics; and research and development. The systems are compact and can be customized to provide up to 6 targets; multiple substrates; high uniformity; computer controlled recipes; substrate cleaning in situ; UHV; load lock; substrate heating; and substrate plasma cleaning.
System Control Technologies
Santa Clara, CA
www.systemcontroltechnologies.com
Tel: 1-408-988-0400
E-mail: sales@systemcontroltechnologies.com
E-Beam Deposition Sources
Telemark offers one of the broadest ranges of multi-pocket rotatable, single pocket UHV, and linear UHV electron beam sources. Options for arc-suppression sources,  reduced beam curl magnetics sources, self-sealing cover plates, large inventory sources and crucibleless sources are available on specific models. Rugged, reliable construction; designed for ease of use and maintainability; side or bottom crucible rotation drive; plug-in emitter assembly for easy filament replacement; all components are maintained in stock. www.telemark.com
E-Beam Tetrode Power Supplies
Telemark produces a wide range of general purpose and production power supplies for electron beam systems. Power ranges are 3 kW, 6 kW, 8 kW, 10 kW, 15 kW, and 20 kW in  the rugged and reliable Tetrode Tube style for maximum flexibility and field serviceability. Dual and triple source options available on the 10 kW and 15 kW models. All supplies come with standard X-Y Sweep controllers with several built-in and adjustable patterns or can be upgraded to fully programmable “Cheetah” X-Y sweep controllers.
Telemark
Hayward, CA
www.telemark.com
Contact: Gary Henderson, President
Tel: 1-510-887-2225
E-mail: sales@telemark.com
Thin Film & Nanotechnology Magnetron Sputtering, Electron Beam Thermal Evaporation Systems
Torr International, Inc. specializes in Thin Film & Nanotechnology Equipment. The current range of products include Standard Table Top low-priced Magnetron  Sputtering systems for diverse applications, from specimen preparation for SEMs to R&D with metal, dielectric and polymer films to Custom-built multi-target sophisticated systems for special applications. We also manufacture Thermal and E-Beam Evaporation systems to suit customers' needs and specialize in Etching systems with different configurations for corrosive and standard applications. We serve a worldwide market in the areas of thin film deposition and etching as well as high vacuum technology. We also supply all the accessories needed for thin film deposition work.
Torr International, Inc.
New Windsor, NY
www.torr.com
Tel: 1-845-565-4027 or 1-888-MAC-TORR
E-mail: torr@torr.com
Roll-Coating Equipment for R&D and Pilot-Scale Applications
ULVAC’s model SPW-030 roll-coating system is designed for R&D and Pilot-scale production applications. Capable of processing a 300 mm-wide web, of various substrate compositions;  either thin-gauge metal rolls, or various polymeric materials, the coater can be equipped with a combination of deposition sources. The SPW-030 can be equipped with up to four sputtering cathodes, and an electron beam evaporation source, for depositing materials of varying compositions. The main deposition drum can be either heated, or cooled, and the system can be equipped with a pre-treatment ion (bombardment) source. The system can be also equipped with additional cooling rollers and a film thickness monitor. www.ulvac.com
SME-200J Thin-Film Battery
Fabrication Equipment
ULVAC has developed a unique equipment suite for depositing all layers of materials required for the fabrication of thin-film batteries (TFB).  The cathode solid electrolyte layer and cathode current collector layers are formed using the cluster-type sputtering system (model: SME-200J). The anode layer is formed by evaporating lithium metal in an evaporation system (model: ei-5). The sealing/packaging layer is formed using a cluster-type evaporator-polymerization system (model PME-200). This Thin Film Battery integrated production system has been jointly developed by ULVAC, Inc. and ULVAC Materials, Inc. A combination of process chambers and deposition sources were selected from ULVAC’s broad product range to provide a suite of equipment ideally suited for TFB applications. In collaboration, Ulvac Materials has developed the appropriate high-density targets (lithium cobalt oxide and lithium phosphate) that optimize the performance with these systems.
ULVAC Technologies, Inc.
Methuen, MA
www.ulvac.com
Tel: 1-978-686-7550
E-mail: sales@us.ulvac.com
Sputtering and Evaporation Inline
VPT’s Inline and Multi-Chamber Vacuum Systems provide tremendous competitive advantages over conventional batch processing. Operating sequential process steps in parallel unleashes design flexibilities and a long list of advantages, including higher throughputs, lowered costs;  Mixed production for less downtime, more scheduling flexibility; Modular designs adapt to future product demands; and Less sensitivity to humidity results in better, more predictable yields. VPT can meet your needs. VPT’s experience with all types of multi-chamber systems and processes insures that you will get an optimum solution for your unique application that meets your unique needs. Please visit for more information about VPT’s ADVANTAGE Inline Evaporation Systems for precision optics and Model CCS3 Modular Inline Sputtering systems. VPT is integrated vertically in order to command strategic capabilities – the local and total control of all key fabrication, programming, integration, development, and testing steps. Know-How Transfer plays a special role in satisfying the needs of a diverse customer base, the systems in VPT’s Coating Development Laboratory continue to play an absolutely essential role in the design of thin films, their process development, and on-going process support.
Vacuum Process Technology, Inc.
Plymouth, MA
www.vptec.com
Tel: 1- 508-732-7200
E-mail: sales@vptec.com
Thin Film Products and Services
Yeagle Technology, Inc. (YTI) Thin Film Products and Services builds and rebuilds new and used vacuum systems for PVD, CVD and PECVD in configurations customized  to specific applications. In addition, YTI offers a variety of vacuum components including a complete line of electrical, fluid, and rotary feedthroughs. An extensive inventory of new, used and rebuilt mechanical, rotary vane and diffusion vacuum pumps are available and in stock. Also offered are power supplies, controllers, process integration components, and Intellitrol® automatic valve controllers. The company also stocks many commodity items. YTI has an exceptional staff of fully trained service engineers to provide comprehensive field service. A complete array of test equipment in each service vehicle allows us to diagnose any vacuum system or electronics problem from air leaks to Zener failure (and everything in-between). Our staff is factory trained on vacuum equipment and support instrumentation. YTI also offers 24 hour/7 days a week emergency service and, inmost cases, can provide 24-hour response time.YTI provides installation, preventative maintenance, or customized service contracts to meet any equipment, facility, or application needs.
YTI Thin Film Products and Services
Ashford, CT
www.ytionline.com
Tel: 1-860-429-1908
E-mail: info@ytionline.com
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Vacuum Technology & Coating